ICP-MS Active Cleaning

Document created by carlos_vargas Employee on May 17, 2020
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This Information Applies To: All Agilent ICP-MS Systems

 

Issue:

Some samples may contain "Sticky" elements that take a long time to leave the system. After cleaning all glassware in the Sample Introduction System as per the maintenance DVD, an extra Active Clean can be performed. 

 

Resolution:

Use appropriate PPE when working with strong acids

  • When “sticky” elements (Tl, Sb, Th, Ag…) are taking too long to rinse out, replace autosampler probe and all other tubing leading up to the nebulizer.

 

  • Option 1 to clean the system: with the plasma off, remove Teflon line from back of nebulizer and hang in a beaker. With all of the sample introduction lines hooked up, move the autosampler probe into 50 ml vials of each of the following solutions:
    • ~30% NH4OH (30 min with peri at 0.3 rps)
    • ~30% HCl (30 min with peri at 0.3 rps)
    • ~30% HNO3 (30 min with peri at 0.3 rps)
    • De-ionized (a few minutes at 0.3 rps)
  • Let each of these solutions flow through the whole sample flow path. You might have to change the Tygon tubing after doing this.

Make sure you empty the 30% NH4OH from beaker before going to acid soluitons

  • Option 2 to clean the system: Clean the probe rinse port by removal then soaking or actively pumping for 15 minutes for each step using the ALS peristaltic pump using the following solutions:
    • MeOH or IPA to remove greasiness
    • De-ionized Water
    • Hot 2% Citrinox Solution
    • De-ionized Water
    • ~30% NH4OH
    • ~30% HCl
    • ~30% HNO3
    • De-ionized Water

 

  • Additional Cleaning Solutions (used in the Semiconductor industry). Use one or both of the following solutions, either as a rinse or for periodic cleaning

 

    

 

 

Learn more on how to effectively operate your Agilent ICP-MS Systems:

ICPMS-0GEN-1010e - Agilent ICP-MS with MassHunter: An Introduction to ICP-MS     e-Learning course on Agilent University 

ICPMS-0GEN-1030e - Agilent ICP-MS with MassHunter: Analysis Considerations  e-Learning course on Agilent University

 

Keywords: Relative Standard Deviation, RSD, memory, contamination, ICPMS, sq, qqq, 7500, 7700, 7800, 7900, 8800, 8900

 

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